Low-temperature epitaxial growth of Si by electron cyclotron resonance chemical vapor deposition

Author： Platen J.   Selle B.   Sieber I.   Brehme S.   Zeimer U.   Fuhs W.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.381, Iss.1, 2001-01, pp. : 22-30

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