Growth of SiGe/Si multiple quantum wells by ultra-high-vacuum electron cyclotron resonance chemical vapor deposition

Author: Joo S.-J.   Yoon E.   Hwang S.-H.   Whang K.-W.   Chun S.K.   Dong Kim Y.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.321, Iss.1, 1998-05, pp. : 111-115

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Abstract