Room temperature electric field induced crystallization of wide band gap hydrogenated amorphous silicon

Author: Pelant I.   Fojtk P.   Luterova K.   Kocka J.   Knzek K.   Stepanek J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.383, Iss.1, 2001-02, pp. : 101-103

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