Large area X-ray detectors based on amorphous silicon technology

By Moy J.-P.  

Thin Solid Films, Vol. 337, Iss. 1, 1999-01 ,pp. : 213-221

Elsevier

Access to resources Recommend Favorite

Application of MSM InP detectors to the measurement of pulsed X-ray radiation

By Ryc L.   Dobrzanski L.   Dubecky F.   Kaczmarczyk J.   Pfeifer M.   Riesz F.   Słysz W.   Surma B.  

Radiation Effects and Defects in Solids, Vol. 163, Iss. 4-6, 2008-04 ,pp. : 559-567

Taylor & Francis Ltd

Access to resources Recommend Favorite

Analysis of X-ray photoelectron spectra of amorphous carbon nitride films

By Song H.   Ilegbusi O.J.  

Thin Solid Films, Vol. 388, Iss. 1, 2001-06 ,pp. : 114-119

Elsevier

Access to resources Recommend Favorite

X-ray photoelectron spectroscopy characterization of amorphous molybdenum oxysulfide thin films

By Benoist L.   Gonbeau D.   Pfister-Guillouzo G.   Schmidt E.   Meunier G.   Levasseur A.  

Thin Solid Films, Vol. 258, Iss. 1, 1995-03 ,pp. : 110-114

Elsevier

Access to resources Recommend Favorite

Stress in hydrogenated amorphous silicon determined by X-ray diffraction

By Harting M.   Woodford S.   Knoesen D.   Bucher R.   Britton D.T.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 153-156

Elsevier

Access to resources Recommend Favorite