Effect of implanted phosphorus on silicide formation in the Cr/Si(111) system

Author: Benouattas N.   Halimi R.   Bouabellou A.   Mosser A.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.385, Iss.1, 2001-04, pp. : 61-65

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Abstract