Pattern evolution during the growth of CrSi 2 layers on Si (111) upon high current pulsed Cr ion implantation

Author: Zhu H.N.   Liu B.X.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.384, Iss.1, 2001-03, pp. : 53-57

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract