Titanium-aluminum nitride film growth and related chemistry using dimethylamino-based precursors

Author: Endle J.P.   Sun Y.-M.   Silverman J.   Nguyen N.   H. Cowley A.   White J.M.   Ekerdt J.G.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.385, Iss.1, 2001-04, pp. : 66-73

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Abstract