Effect of oxidized Al prelayer for the growth of polycrystalline Al 2 O 3 films on Si using ionized beam deposition

Author： Whangbo S.W. Choi Y.K. Jang H.K. Chung Y.D. Lyo I.W. Whang C.N.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.388, Iss.1, 2001-06, pp. : 290-294

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Effect of Al pre-deposition layer on the epitaxial growth of silicon on Al 2 O 3 /Si (111) substrates

By Ishida M. Jung Y.-C. Miura H. Koji Y. Sawada K. Yoshimoto M. Keisuke M. Takahumi M. Hideaki M.

Thin Solid Films, Vol. 369, Iss. 1, 2000-07 ,pp. : 134-137

Elsevier

Access to resources Recommend Favorite

Effect of substrate temperature on the texture and structure of polycrystalline Si 0.7 Ge 0.3 films deposited on SiO 2 by molecular beam deposition

By Seung Kim H. Yong Lee J.

Thin Solid Films, Vol. 350, Iss. 1, 1999-08 ,pp. : 14-20

Elsevier

Access to resources Recommend Favorite

High quality optoelectronic grade epitaxial AlN films on -Al 2 O 3 , Si and 6H-SiC by pulsed laser deposition

By Vispute R.D. Narayan J. Budai J.D.

Thin Solid Films, Vol. 299, Iss. 1, 1997-05 ,pp. : 94-103

Elsevier

Access to resources Recommend Favorite

Transparent polycrystalline nanoceramics consisting of triclinic Al₂SiO₅ kyanite and Al₂O₃ corundum

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, Vol. 101, Iss. 3, 2018-03 ,pp. : 998-1003

John Wiley & Sons Inc

Access to resources Recommend Favorite

Al 2 O 3 formation on Si by catalytic chemical vapor deposition

By Ogita Y.-I. Iehara S. Tomita T.

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 161-164

Elsevier

Access to resources Recommend Favorite