Characterization of multilayered Ti/TiN films grown by chemical vapor deposition

By Hu J.C.   Chang T.C.   Chen L.J.   Yang Y.L.   Chang C.Y.  

Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. : 423-427

Elsevier

Access to resources Recommend Favorite

Comparison of tribological behavior of three films - TiN, TiCN and CrN - grown by physical vapor deposition

By Su Y.L.   Yao S.H.   Leu Z.L.   Wei C.S.   Wu C.T.  

Wear, Vol. 213, Iss. 1, 1997-12 ,pp. : 165-174

Elsevier

Access to resources Recommend Favorite

A comparative study on the properties of TiN films prepared by chemical vapor deposition enhanced by r.f. plasma and by electron cyclotron resonance plasma

By Lee W.-J.   Kim J.-S.   Jun B.-H.   Lee E.-J.   Hwang C.-Y.  

Thin Solid Films, Vol. 292, Iss. 1, 1997-01 ,pp. : 124-129

Elsevier

Access to resources Recommend Favorite

Effects of chlorine on tribological properties of TiN films prepared by pulsed d.c. plasma-enhanced chemical vapor deposition

By Kawata K.   Sugimura H.   Takai O.  

Thin Solid Films, Vol. 407, Iss. 1, 2002-03 ,pp. : 38-44

Elsevier

Access to resources Recommend Favorite

Microstructure and conductivity of large area nanocrystalline silicon films grown by specially designed thermal-assisted chemical vapor deposition

By Zhang X.-w.   Han G.-r.  

Thin Solid Films, Vol. 415, Iss. 1, 2002-08 ,pp. : 5-9

Elsevier

Access to resources Recommend Favorite