Characterization of multilayer films of Ti&unknown;Al&unknown;O&unknown;C&unknown;N system prepared by pulsed d.c. plasma-enhanced chemical vapor deposition

By Kawata K.   Sugimura H.   Takai O.  

Thin Solid Films, Vol. 390, Iss. 1, 2001-06 ,pp. : 64-69

Elsevier

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A comparative study on the properties of TiN films prepared by chemical vapor deposition enhanced by r.f. plasma and by electron cyclotron resonance plasma

By Lee W.-J.   Kim J.-S.   Jun B.-H.   Lee E.-J.   Hwang C.-Y.  

Thin Solid Films, Vol. 292, Iss. 1, 1997-01 ,pp. : 124-129

Elsevier

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Effects of deposition parameters on composition, structure, resistivity and step coverage of TiN thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

By Kim J.-S.   Lee E.-J.   Baek J.-T.   Lee W.-J.  

Thin Solid Films, Vol. 305, Iss. 1, 1997-08 ,pp. : 103-109

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Structural properties of amorphous carbon nitride films prepared by remote plasma-enhanced chemical vapor deposition

By Baik H.K.   Kim J.H.   Kim Y.H.   Choi D.J.  

Thin Solid Films, Vol. 289, Iss. 1, 1996-11 ,pp. : 79-83

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Optical properties of silicon nanocrystallites in polycrystalline silicon films prepared at low temperature by plasma-enhanced chemical vapor deposition

By Milovzorov D.E.   Ali A.M.   Inokuma T.   Kurata Y.   Suzuki T.   Hasegawa S.  

Thin Solid Films, Vol. 382, Iss. 1, 2001-02 ,pp. : 47-55

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