Study of GaAs and GaInP etching in Cl 2 /Ar electron cyclotron resonance plasma

Author: Yoon S.F.   Ng T.K.   Zheng H.Q.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.394, Iss.1, 2001-08, pp. : 249-254

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Abstract