The altered layer formation during the reactive ion etching of GaAs in CF 2 Cl 2 +O 2 plasma

Author: Grigonis A.   Galdikas A.   Pranevicius L.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.51, Iss.2, 1998-10, pp. : 211-215

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Abstract