High-deposition rate a-Si:H n-i-p solar cells grown by HWCVD

Author: Nelson B.P.   Iwaniczko E.   Mahan A.H.   Wang Q.   Xu Y.   Crandall R.S.   Branz H.M.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.395, Iss.1, 2001-09, pp. : 292-297

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Abstract