High rate deposition of a-Si:H and a-SiN x :H by VHF PECVD

Author： Takagi T. Takechi K. Nakagawa Y. Watabe Y. Nishida S.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.51, Iss.4, 1998-12, pp. : 751-755

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