Formation of 'environmentally friendly' semiconductor ( -FeSi 2 ) thin films prepared by ion beam sputter deposition (IBSD) method

Author： Sasase M.   Nakanoya T.   Yamamoto H.   Hojou K.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.401, Iss.1, 2001-12, pp. : 73-76

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