Silicon inclusion effect on fullerene formation under induction thermal plasma condition

Author： Wang C.   Imahori T.   Tanaka Y.   Sakuta T.   Takikawa H.   Matsuo H.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.407, Iss.1, 2002-03, pp. : 72-78

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