Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering

Author： Shaginyan L.R. Misina M. Zemek J. Musil J. Regent F. Britun V.F.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.408, Iss.1, 2002-04, pp. : 136-147

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