Influence of thickness and growth temperature on the properties of zirconium oxide films grown by atomic layer deposition on silicon

Author: Kukli K.   Ritala M.   Uustare T.   Aarik J.   Forsgren K.   Sajavaara T.   Leskela M.   Harsta A.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.410, Iss.1, 2002-05, pp. : 53-60

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Abstract