Author: Klaver P. Thijsse B.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.413, Iss.1, 2002-06, pp. : 110-120
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Thermal diffusion in molecular dynamics simulations of thin film diamond deposition
By Pailthorpe B.A. Mitchell D. Bordes N.S.
Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. :
Enhanced thermal stability of TA-based thin diffusion barriers by ion implantation
By Peikert M. Wieser E. Reuter H. Wenzel C.
Vacuum, Vol. 69, Iss. 1, 2002-12 ,pp. :