Relationship between structure and mechanical properties in hard Al-Si-Cu-N films prepared by magnetron sputtering

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.413, Iss.1, 2002-06, pp. : 121-130

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Structural and Optical Properties of Al-Zn-Cu Thin Films Prepared by DC-Magnetron Sputtering at Different Sputtering Powers

By Dejam Laya Elahi S. Mohammad

Molecular Crystals and Liquid Crystals, Vol. 577, Iss. 1, 2013-08 ,pp. : 59-70

Taylor & Francis Ltd

Access to resources Recommend Favorite

Structure and characteristics of ZnO:Al/n-Si heterojunctions prepared by magnetron sputtering

By Song D. Neuhaus D.-H. Xia J. Aberle A.G.

Thin Solid Films, Vol. 422, Iss. 1, 2002-12 ,pp. : 180-185

Elsevier

Access to resources Recommend Favorite

Structure and composition of (Ti, Al)N films prepared by r.f. planar magnetron sputtering using a composite target

By Inoue S. Uchida H. Koterazawa K. Hioki A. Howson R.P.

Thin Solid Films, Vol. 271, Iss. 1, 1995-12 ,pp. : 15-18

Elsevier

Access to resources Recommend Favorite

Phase transition and properties of Ti-Al-N thin films prepared by r.f.-plasma assisted magnetron sputtering

By Zhou M. Makino Y. Nose M. Nogi K.

Thin Solid Films, Vol. 339, Iss. 1, 1999-02 ,pp. : 203-208

Elsevier

Access to resources Recommend Favorite

Structure and Photoelectric Properties of Cu₃N Thin Films by Reactive Magnetron Sputtering

Materials Science Forum, Vol. 2015, Iss. 814, 2015-04 ,pp. : 620-624

Trans Tech Publications

Access to resources Recommend Favorite