Copper interaction with a Ta silicate surface: implications for interconnect technology

Author: Zhao X.   Magtoto N.P.   Leavy M.   Kelber J.A.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.415, Iss.1, 2002-08, pp. : 308-314

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract