High rate deposition of transparent conducting oxide thin films by vacuum arc plasma evaporation

Author: Minami T.   Ida S.   Miyata T.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.416, Iss.1, 2002-09, pp. : 92-96

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract