Hafnium tetraiodide and oxygen as precursors for atomic layer deposition of hafnium oxide thin films

Author: Aarik J.   Sundqvist J.   Aidla A.   Lu J.   Sajavaara T.   Kukli K.   Harsta A.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.418, Iss.2, 2002-10, pp. : 69-72

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Abstract