Low-temperature deposition of carbon nitride films from a molecular azide, (C 3 N 3 )(N 3 ) 3

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.422, Iss.1, 2002-12, pp. : 62-68

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Plasma-assisted deposition of BN thin films from B(N 3 ) 3

By Hobbs K.R. Coombe R.D.

Thin Solid Films, Vol. 402, Iss. 1, 2002-01 ,pp. : 162-166

Elsevier

Access to resources Recommend Favorite

Chemical vapour deposition of polycrystalline AlN films from AlCl 3 -NH 3 mixtures: II - surface morphology and mechanisms of preferential orientation at low-pressure

By Dollet A. Casaux Y. Matecki M. Rodriguez-Clemente R.

Thin Solid Films, Vol. 406, Iss. 1, 2002-03 ,pp. : 118-131

Elsevier

Access to resources Recommend Favorite

Formation of cubic C 3 N 4 thin films by plasma enhanced chemical vapor deposition

By Zhang Z. Guo H. Zhong G. Xiong Q. Yu F. Fan X.

Thin Solid Films, Vol. 346, Iss. 1, 1999-06 ,pp. : 96-99

Elsevier

Access to resources Recommend Favorite

Chemical vapour deposition of polycrystalline AlN films from AlCl 3 -NH 3 mixtures. - Analysis and modelling of transport phenomena

By Dollet A. Casaux Y. Chaix G. Dupuy C.

Thin Solid Films, Vol. 406, Iss. 1, 2002-03 ,pp. : 1-16

Elsevier

Access to resources Recommend Favorite

Plasma assisted chemical vapour deposition of boron nitride coatings from using BCl 3 -N 2 -H 2 -Ar gas mixture

By Rossi F. Schaffnit C. Thomas L. del Puppo H. Hugon R.

Vacuum, Vol. 52, Iss. 1, 1999-01 ,pp. : 169-181

Elsevier

Access to resources Recommend Favorite