Chemical vapour deposition of polycrystalline AlN films from AlCl 3 -NH 3 mixtures: II - surface morphology and mechanisms of preferential orientation at low-pressure

Author： Dollet A.   Casaux Y.   Matecki M.   Rodriguez-Clemente R.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.406, Iss.1, 2002-03, pp. : 118-131

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