Author： Hsieh J.H. Li C. Wu W. Hochman R.F.
Publisher： Elsevier
ISSN： 0040-6090
Source： Thin Solid Films, Vol.424, Iss.1, 2003-01, pp. : 103-106
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Mechanical measurement of the residual stress in thin PVD films
By Vijgen R.O.E. Dautzenberg J.H.
Thin Solid Films, Vol. 270, Iss. 1, 1995-12 ,pp. :
Access to resources
Recommend
Plasma-assisted deposition of tungsten-containing siloxane thin films
By Fracassi F. d'Agostino R. Palumbo F. Bellucci F. Monetta T.
Thin Solid Films, Vol. 264, Iss. 1, 1995-08 ,pp. :
Residual stress and cracking in thin PVD coatings
By Teixeira V.
Vacuum, Vol. 64, Iss. 3, 2002-01 ,pp. :