Interface properties of ultra-thin HfO 2 films grown by atomic layer deposition on SiO 2 /Si

Author： Renault O.   Samour D.   Rouchon D.   Holliger P.   Papon A.-M.   Blin D.   Marthon S.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.428, Iss.1, 2003-03, pp. : 190-194

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