Thermodynamic study and characterization of low pressure chemically vapor deposited silicon oxynitride films from tetraethylorthosilicate, dichlorosilane and ammonia gas mixtures

Author： Vamvakas V.E.   Davazoglou D.   Berjoan R.   Schamm S.   Vahlas C.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.429, Iss.1, 2003-04, pp. : 77-83

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