Optical absorption threshold of low pressure chemically vapor deposited silicon oxynitride films from SiCl 2 H 2 &unknown;NH 3 &unknown;N 2 O mixtures

Author： Davazoglou D.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.437, Iss.1, 2003-08, pp. : 266-271

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