Influence of gas supply and filament geometry on the large-area deposition of amorphous silicon by hot-wire CVD

By Ledermann A.   Weber U.   Mukherjee C.   Schroeder B.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 61-65

Elsevier

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Hot-wire deposition of amorphous and microcrystalline silicon using different gas excitations by a coiled filament

By Deng X.   Povolny H.S.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 304-308

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High-rate deposition of silicon thin-film solar cells by the hot-wire cell method

By Konagai M.   Tsushima T.   Kim M.-K.   Asakusa K.   Yamada A.   Kudriavtsev Y.   Villegas A.   Asomoza R.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 152-156

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Hot-wire deposition of photonic-grade amorphous silicon

By Fortmann C.M.   Jaen E.L.   Hata N.   Anderson W.A.   Mahan A.H.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 142-146

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Deposition of hydrogenated amorphous silicon (a-Si:H) films by hot wire chemical vapor deposition: role of filament temperature

By Jadkar S.R.   Sali J.V.   Kshrisagar S.T.   Takwale M.G.  

Thin Solid Films, Vol. 437, Iss. 1, 2003-08 ,pp. : 18-24

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