The role of hydrogen dilution of silane and phosphorus doping on hydrogenated microcrystalline silicon ( c-Si:H) films prepared by hot-wire chemical vapor deposition (HW-CVD) technique

By Jadkar S.R.   Sali J.V.   Takwale M.G.   Musale D.V.   Kshirsagar S.T.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 206-212

Elsevier

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Fabrication of amorphous carbon nitride films by hot-wire chemical vapor deposition

By Yokomichi H.   Masuda A.   Kishimoto N.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 249-252

Elsevier

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Room temperature deposition of hydrogenated amorphous carbon films from laser-assisted photolytic chemical vapor deposition at 248 nm

By Lindstam M.   Boman M.   Piglmayer K.  

Thin Solid Films, Vol. 394, Iss. 1, 2001-08 ,pp. : 114-123

Elsevier

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High-rate deposition of amorphous silicon films using hot-wire CVD with a coil-shaped filament

By Povolny H.S.   Deng X.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 125-129

Elsevier

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Guiding principles for device-grade hydrogenated amorphous silicon films and design of catalytic chemical vapor deposition apparatus

By Masuda A.   Matsumura H.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 112-115

Elsevier

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