Preparation of poly-Si films by Cat-CVD for thin film transistor

By Sunayama H.   Yamada K.   Karasawa M.   Ishibashi K.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 226-229

Elsevier

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Thin film poly-Si formation by Cat-CVD method and its application for solar cells

By Niira K.   Senta H.   Hakuma H.   Komoda M.   Okui H.   Fukui K.   Arimune H.   Shirasawa K.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 315-319

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A Cat-CVD Si 3 N 4 film study and its application to the ULSI process

By Uchiyama Y.   Masuda A.   Matsumura H.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 275-279

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Characterization of Cat-CVD grown Si-C and Si-C-O dielectric films for ULSI applications

By Takatsuji K.   Kawakami M.   Makita Y.   Murakami K.   Nakayama H.   Miura Y.   Shimoyama N.   Machida H.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 116-119

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Preparation of B-doped a-Si 1-x C x :H films and heterojunction p-i-n solar cells by the Cat-CVD method

By Chikusa K.   Takemoto K.   Itoh T.   Yoshida N.   Nonomura S.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 245-248

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