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Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 315-319

Elsevier

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Preparation of SiO 2 thin films using the Cat-CVD method

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Formation of low-resistivity poly-Si and SiN x films by Cat-CVD for ULSI application

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Excimer laser annealed poly-Si thin film transistor with self-aligned lightly doped drain structure

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Fabrication of excimer laser annealed poly-Si thin film transistor by using an elevated temperature ion shower doping

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