Interaction of amorphous Si and crystalline Al thin films during low-temperature annealing in vacuum

Author： Zhao Y.H.   Wang J.Y.   Mittemeijer E.J.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.433, Iss.1, 2003-06, pp. : 82-87

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