The influence of carbon content in carbon-doped silicon oxide film by thermal treatment

Author： Yang C.S.   Yu Y.-H.   Lee K.-M.   Lee H.-J.   Choi C.K.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.435, Iss.1, 2003-07, pp. : 165-169

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