Study on self-bias voltage induced on the substrate by r.f. bias power in a high density plasma

Author: Kim J.-H.   Shin Y.-H.   Chung K.-H.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.435, Iss.1, 2003-07, pp. : 288-292

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Abstract