Author: Ichiki T. Sugiyama Y. Taura R. Koidesawa T. Horiike Y.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.435, Iss.1, 2003-07, pp. : 62-68
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Plasma physics and technology; industrial applications
Vacuum, Vol. 64, Iss. 3, 2002-01 ,pp. :
By Sabella S. Vecchio G. Brunetti V. Cingolani R. Rinaldi R. Pompa P.
Journal of Analytical Chemistry, Vol. 66, Iss. 5, 2011-05 ,pp. :
Advanced plasma technology in microelectronics
By Jung C.O. Chi K.K. Hwang B.G. Moon J.T. Lee M.Y. Lee J.G.
Thin Solid Films, Vol. 341, Iss. 1, 1999-03 ,pp. :
Applications of Protein Microarray Technology
Combinatorial Chemistry & High Throughput Screening, Vol. 10, Iss. 8, 2007-09 ,pp. :
Pyrometry applications in thermal plasma processing
By Bertrand P. Ignatiev M. Flamant G. Smurov I.
Vacuum, Vol. 56, Iss. 1, 2000-01 ,pp. :