Influence of low energy ion implantation on mechanical properties of magnetron sputtered metastable (Cr,Al)N thin films

Author： Ulrich S.   Holleck H.   Ye J.   Leiste H.   Loos R.   Stuber M.   Pesch P.   Sattel S.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.437, Iss.1, 2003-08, pp. : 164-169

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