Highly conformal atomic layer deposition of tantalum oxide using alkylamide precursors

Author： Hausmann D.M.   de Rouffignac P.   Smith A.   Gordon R.   Monsma D.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.443, Iss.1, 2003-10, pp. : 1-4

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