A method for in situ measurement of the residual stress in thin films by using the focused ion beam

Author： Kang K.J.   Yao N.   He M.Y.   Evans A.G.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.443, Iss.1, 2003-10, pp. : 71-77

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