In-situ stress measurement during the deposition of CN x thin films by unbalanced magnetron sputtering; formation of high levels of stress with 28 eV ion irradiation

Author： I. F. Brunell  

Publisher： Taylor & Francis Ltd

ISSN： 1362-3036

Source： Philosophical Magazine Letters, Vol.84, Iss.6, 2004-06, pp. : 395-403

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