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Elsevier

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Etch-induced damage in single crystal Si trench etching by planar inductively coupled Cl 2 /N 2 and Cl 2 /HBr plasmas

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Thin Solid Films, Vol. 341, Iss. 1, 1999-03 ,pp. : 168-171

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Measurement of neutral gas temperature in inductively coupled plasmas

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Diagnoses of inductively coupled SF 6 and N 2 plasmas at atmospheric pressure

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High rate sapphire (Al 2 O 3 ) etching in inductively coupled plasmas using axial external magnetic field

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