Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO 2 films

Author： Ohno S. Sato D. Kon M. Song P.K. Yoshikawa M. Suzuki K. Frach P. Shigesato Y.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.445, Iss.2, 2003-12, pp. : 207-212

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