Erratum to ''Comparison of the ZnO:Al films deposited in static and dynamic modes by reactive mid-frequency magnetron sputtering'' [J. Crystal Growth 253 (2003) 117-128]

Author： Hong R.J.   Jiang X.   Szyszka B.   Sittinger V.   Xu S.H.   Werner W.   Heide G.  

Publisher： Elsevier

ISSN： 0022-0248

Source： Journal of Crystal Growth, Vol.260, Iss.3, 2004-01, pp. : 606-606

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