Author: Alexandrova S. Szekeres A.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.51, Iss.3, 1998-11, pp. : 469-472
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Process control of RF plasma assisted surface cleaning
By Steffen H. Schwarz J. Kersten H. Behnke J.F. Eggs C.
Thin Solid Films, Vol. 283, Iss. 1, 1996-09 ,pp. :
Thin-oxide MOS damage caused by wafer charging in magnetized helium plasma
Thin Solid Films, Vol. 264, Iss. 1, 1995-08 ,pp. :
MOS capacitor characteristics of plasma oxide on partially strained SiGeC films
By Ray S.K. Bera L.K. Maiti C.K. John S. Banerjee S.K.
Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. :