MOS capacitor characteristics of plasma oxide on partially strained SiGeC films

Author: Ray S.K.   Bera L.K.   Maiti C.K.   John S.   Banerjee S.K.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.332, Iss.1, 1998-11, pp. : 375-378

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Abstract