Author: Ha J.H. Yi D.H. Kim J.J.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.51, Iss.4, 1998-12, pp. : 519-524
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Sub-half micron etching of resist below room temperature using O 2 supermagnetron plasma
By Kinoshita H.
Vacuum, Vol. 55, Iss. 1, 1999-10 ,pp. :
SiO 2 Etching using high density plasma sources
By Tsukada T. Nogami H. Nakagawa Y. Wani E. Mashimo K. Sato H. Samukawa S.
Thin Solid Films, Vol. 341, Iss. 1, 1999-03 ,pp. :
Reactive ion etching of Pt electrode using O 2 -based plasma
Vacuum, Vol. 71, Iss. 4, 2003-07 ,pp. :