Reactive ion etching of Pt electrode using O 2 -based plasma

Author: Kim H.W.   Kang C.-J.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.71, Iss.4, 2003-07, pp. : 491-496

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract