Advanced sputtering techniques for high rate-, plasma free- deposition and excellent target utility with uniform erosion

Author: Kadokura S.   Naoe M.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.51, Iss.4, 1998-12, pp. : 683-686

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract