Etching of RuO 2 and Pt thin films with ECR/RF reactor

Author: Baborowski J.   Muralt P.   Ledermann N.   Hiboux S.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.56, Iss.1, 2000-01, pp. : 51-56

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Abstract