Author: Baborowski J. Muralt P. Ledermann N. Hiboux S.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.56, Iss.1, 2000-01, pp. : 51-56
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
A study of residual stress on rf reactively sputtered RuO 2 thin films
Thin Solid Films, Vol. 375, Iss. 1, 2000-10 ,pp. :
Raman spectroscopy analysis of magnetron sputtered RuO 2 thin films
By Meng L.-j. Teixeira V. dos Santos M.P.
Thin Solid Films, Vol. 442, Iss. 1, 2003-10 ,pp. :
Growth of RuO 2 thin films by pulsed-laser deposition
By Hiratani M. Matsui Y. Imagawa K. Kimura S.
Thin Solid Films, Vol. 366, Iss. 1, 2000-05 ,pp. :